Spatial coherence control and analysis via micromirror-based mixed-state ptychography

Flexible and fast control of the phase and amplitude of coherent light, enabled by digital micromirror devices (DMDs) and spatial light modulators (SLMs), has been a driving force for recent advances in optical tweezers, nonlinear microscopy, and wavefront shaping. In contrast, engineering spatially partially coherent light remains widely elusive due to the lack of tools enabling a joint analysis and control sequence. Here, we report an approach to coherence engineering that combines a quasi-monochromatic, thermal source and a DMD together with a ptychographic scanning microscope. The reported method opens up new routes to low-cost coherence control, with applications in micromanipulation, nanophotonics, and quantitative phase contrast imaging

Double moiré localized plasmon structured illumination microscopy

Structured illumination microscopy (SIM) is a well-established fluorescence imaging technique, which can increase spatial resolution by up to a factor of two. This article reports on a new way to extend the capabilities of structured illumination microscopy, by combining ideas from the fields of illumination engineering and nanophotonics. In this technique, plasmonic arrays of hexagonal symmetry are illuminated by two obliquely incident beams originating from a single laser. The resulting interference between the light grating and plasmonic grating creates a wide range of spatial frequencies above the microscope passband, while still preserving the spatial frequencies of regular SIM. To systematically investigate this technique and to contrast it with regular SIM and localized plasmon SIM, we implement a rigorous simulation procedure, which simulates the near-field illumination of the plasmonic grating and uses it in the subsequent forward imaging model. The inverse problem, of obtaining a super-resolution (SR) image from multiple low-resolution images, is solved using a numerical reconstruction algorithm while the obtained resolution is quantitatively assessed. The results point at the possibility of resolution enhancements beyond regular SIM, which rapidly vanishes with the height above the grating. In an initial experimental realization, the existence of the expected spatial frequencies is shown and the performance of compatible reconstruction approaches is compared. Finally, we discuss the obstacles of experimental implementations that would need to be overcome for artifact-free SR imaging

Uncertainty Estimation and Design Optimization of 2D Diffraction-Based Overlay Metrology Targets

Scatterometry is an optical metrology technique in which light scattered from a specifically designed grating stack (overlay target) is measured in the far-field. Using 1D periodic overlay target designs, the technique has been shown to have nanometer-scale sensitivity to spatial misalignments of subsequent patterned layers, which are also known as overlay errors. However, while scatterometry is highly sensitive to overlay errors, multiple sources of systematic errors hinder its absolute accuracy. Here, we investigate how an extended version of scatterometry called Fourier scatterometry, in combination with more complex overlay target designs, can help addressing those challenges. To this end, we developed a statistical method that can determine the influence of 2D overlay targets on the overlay measurement uncertainty. We study periodic and deterministic aperiodic designs as well as designs that emerged from simulated annealing optimizations. Our results suggest that current overlay target designs could be augmented by more complex 2D designs to fulfill specific purposes, such as fabrication robustness and high sensitivity over a large overlay range